Chemical Vapor Deposition
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Recent papers in Chemical Vapor Deposition
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Transparent conducting ZnO:F was deposited as thin films on soda lime glass substrates by atmospheric pressure chemical vapor deposition (CVD) deposition at substrate temperatures of 480–500 °C. The precursors diethylzinc,... more
Extensive research and development programs on the (Very) High Temperature gas cooled Reactor (V/HTR) are being conducted by many countries mainly promoted by the attractiveness of this concept and its capability for other applications... more
Self-assembled Si nanowires can be grown using chemical vapor deposition accelerated by metal catalyst nanoparticles. The diameter of the nanowires depends on the size of the nanoparticles, which in turn can be controlled by varying the... more
CVD nedir,CVD yapilma yontemleri ,
yontemlerin farklari, avantajlari,PCV ve CVD farki
yontemlerin farklari, avantajlari,PCV ve CVD farki
Recent progress with indium (III) sulfide (In2S3)-buffered thin film solar cells (TFSC) was briefly reviewed. In2S3 has emerged as a promising low-hazard buffer (or window) material, and has proven to improve the properties of the solar... more
This article provides an overview of the state-of-the-art chemistry and processing technologies for silicon nitride and silicon nitride-rich films, i.e., silicon nitride with C inclusion, both in hydrogenated (SiN x :H and SiN x :H(C))... more
The chemical vapor deposition (CVD) of metals is a rapidly developing area in which metal-containing compounds are being synthesized as new precursors. This article reviews this area and discusses precursor design, reaction pathways,... more
journal homepage:papers.itc.pw.edu.pl Numerical modeling of the CO2 desorption process coupled with phase transformation and heat transfer in a CCS installation
A stagnation point cold-wall reactor was used for the CVD of corundum alumina (α-Al2O3) on metallic substrates. Depositions were carried out under low pressure using the thermally induced pyrolytic oxidation of aluminum tri-isopropoxide... more
Aim of this research is to develop an effective way in producing multi-walled carbon nanotubes (MWNTs) via chemical vapour deposition method using acetylene as carbon source and synthesized mesoporous M/MCM-41 (M = Ni, Co and Fe) as... more
Nanostructured α-Fe2O3 thin film electrodes were deposited by aerosol-assisted chemical vapour deposition (AACVD) for photoelectrochemical (PEC) water splitting on conducting glass substrates using 0.1 M methanolic solution of Fe(acac)3.... more
Zinc sulphide thin films were prepared by chemical bath deposition (CBD) and the properties of these films are compared with those deposited by Physical vapour deposition (PVD). The variation in the optical and electrical properties of... more