Ultraviolet

What aspects of optical fabrication technology need to be developed so as to facilitate existing planned missions, or enable new ones? Throughout the submillimeter to UV wavelengths, the common goal is to push technology to the limits to make the largest possible apertures that are diffraction limited. At any one wavelength, the accuracy of the surface must be better than lambda/30 (rms error). The wavelength range is huge, covering four orders of magnitude from 1 mm to 100 nm. At the longer wavelengths, diffraction limited surfaces can be shaped with relatively crude techniques. The challenge in their fabrication is to make as large as possible a reflector, given the weight and volume constraints of the launch vehicle. The limited cargo diameter of the shuttle has led in the past to emphasis on deployable or erectable concepts such as the Large Deployable Reflector (LDR), which was studied by NASA for a submillimeter astrophysics mission. Replication techniques that can be used to produce light, low-cost reflecting panels are of great interest for this class of mission. At shorter wavelengths, in the optical and ultraviolet, optical fabrication will tax to the limit the most refined polishing methods. Methods of mechanical and thermal stabilization of the substrate will be severely stressed. In the thermal infrared, the need for large aperture is tempered by the even stronger need to control the telescope's thermal emission by cooled or cryogenic operation. Thus, the SIRTF mirror at 1 meter is not large and does not require unusually high accuracy, but the fabrication process must produce a mirror that is the right shape at a temperature of 4 K. Future large cooled mirrors will present more severe problems, especially if they must also be accurate enough to work at optical wavelengths. At the very shortest wavelengths accessible to reflecting optics, in the x-ray domain, the very low count fluxes of high energy photons place a premium on the collecting area. It is not necessary to reach or even approach the diffraction limit, which would demand subnanometer fabrication and figure control. Replication techniques that produce large very lightweight surfaces are of interest for x-ray optics just as they are for the submillimeter region. Optical fabrication requirements are examined in more detail for missions in each of the three spectral regions of interest in astrophysics.